The following companies seem to be the players in the new world of direct write lithography for pcbs and advanced ic packages. Aiscent technologies china they have a very impressive description of their. The investigated system combines optofluidic maskless lithography and optically induced dielectrophoresis odep. We have an extensive network of sales offices around the world.
Based on twophoton polymerization 2pp, it allows for additive manufacturing and maskless litho graphy with the same device. It can be employed as a switch of light in a special direction and a laser shaper for laser beams. The system is equipped with high power led light sources at 365nm, 385nm, and 405nm, ensuring compatibility with most commercial photoresists. Maskless lithography based on digital micromirror device. Has maskless lithography s we used to call it direct write lithography time really come. The aswritten patterns in the poly phthaladehyde thermal resist layer have a depth of 8 nm, and they are transformed into highaspect ratio binary patterns in the high carbon content resist using a sio2 hard.
Highresolution maskless lithography kin foong chan zhiqiang feng ren yang akihito ishikawa wenhui mei ball semiconductor, incorporated 415 century parkway allen, texas 7508043 abstract. Parallel maskless optical lithography for prototyping, low. Maskless beam pen lithography based on integrated microlens array and spatialfilter array. If so, what is the expected impact on the mask manufacturer and does it matter. The current slm has 1088 switching elements and can operate at 0. A system and method for maskless direct write lithography are disclosed. Benefits of maskless lithography in the tail offloading of high capacity systems lowers the threshold for customized products in advanced technology potential to extend the tail with new products business mask cost savings in existing tail maximize utilization of flx system in combination with segment, payback in maskless lithography system. Projection printing operating at pro zdorove 10 2011 pdf the conventional rayleigh diffraction. University of arizona optical sciences center high speed. This places stringent data handling requirements on the design of any directwrite maskless system. The maskless aligner for volume production the mla300 features our powerful maskless aligner technology that has been specifically adapted to the requirements of highthroughput production applications.
Maskless lithography systems rotalab scientific instruments. This paper introduces the laser shaping into maskless projection soft lithography by using dmd, errordiffu. The economics of maskless lithography gives a crossover volume from maskless to maskbased lithography at surprisingly many wafers per mask for surprisingly few wafers per hour throughput. Meanwhile, dmd can be treated as a kind of spatial light modulator in digital light processing. However because of its relatively low throughput compared to optical lithography, electron beam lithography has never been the mainstream lithography. Supplemental information high resolution graphene films for electrochemical sensing via inkjet maskless lithography john a. Maskless lithography by rajesh menon, amil patel, dario gil, and henry i. In zpal, the rate of information transfer is the product of the number of zone plates in the array and the switching speed of the slm. Maskless lithography utilizes methods that directly transfer the information onto the substrate, without utilizing an intermediate static mask, i. An innovative highresolution maskless lithography system is designed employing a. It uses light to transfer a geometric pattern from a photomask also called an optical mask to a photosensitive that is, lightsensitive chemical photoresist on the substrate. Maskless photolithography is commonly used for generating photomasks for semiconductor and lcd industries.
Hence, compression results should be reported with this target pixel size in mind. A uv light emitting diode led with a maximum output of 372 nm was collimated using a pinhole and a small plastic tube and focused using a microscope objective onto a substrate for direct lithographic patterning of the photoresist. A mask manufacturers perspective on maskless lithography. An innovative highresolution maskless lithography system is designed employing a combination of low and highnumericalaperture. In scanning electron beam lithography, instead of light, electron beam is used and the setup and principle.
A new type of maskless lithography system based on digital mirror device dmd is proposed, constructed, and experimentally demonstrated. Aspe an n u a l mee ting 2011 from deepwater drilling to. Additive manufacturing and maskless lithography in one device. Claussen1 1department of mechanical engineering, iowa state university, ames, ia 50011 2department of genetics, development and cell biology, iowa state university, ames, ia.
In zpal, an array of diffractive lenses is used to form an array of spots on the substrate. Highresolution maskless lithography semantic scholar. University of california, berkeley 2000 a dissertation submitted in partial satisfaction of the requirements for the degree of doctor of philosophy in. Thermal scanning probe lithography is used for creating lithographic patterns with 27. In this technique, a pattern is first created on a reticle or mask. This thesis investigates a focused ion beam system for maskless, resistless patterning that can be made practical for highvolume production. Here we propose and experimentally demonstrate a high numerical.
Maskless lithography an overview sciencedirect topics. Osa supercritical lens array in a centimeter scale. High speed maskless lithography of printed circuit boards. The method includes receiving a plurality of pixels that represent an integrated circuit ic layout. Carterb department of electrical engineering and computer science and research laboratory of electronics. This work presents an approach to overcome the throughput problem by compressing the layout data and decompressing it on the chip that interfaces to the writers. Hdp550 data sheet pdf they claim to have a proprietary data processing system that can process image files onthefly without waiting time to ensure fast and accuracy scanning even for a large exposure area. To achieve the throughput of one wafer layer per minute with a directwrite maskless lithography system, using 22 nm pixels for 45 nm technology, a data rate of 12 tbs is required. Eecs department, university of california, berkeley, ca 94720, usa available online 9 march 2004 abstract in this paper, we consider the composition of integrated circuit patterns using dense arrays of. The printed circuit board pcb industry has long used a lithography process based on a polymer mask in contact with a large, resistcoated substrate. The potential of this maskless lithography system is substantial. Mirrorbased pattern generation for maskless lithography william g.
Lossless compression techniques for maskless lithography. Directwrite lithography uses a laser with light modulator to write the feature onto the surface. Maskless lithography for low volume production maskless lithography can be advantageous mainly due to high mask cost. Us9761411b2 system and method for maskless direct write.
Microlens arrays mlas are widely used in optical imaging, dense wavelength division multiplexing, optical switching, and microstructure patterning, etc. Bruker formerly rave np sf100 lightning the sf100 lightning is a fast and flexible maskless lithography system which can reach submicron resolution. Optimization methods for 3d lithography process utilizing. It includes a pinhole array sandwiched by two microlens arrays on each side, known as doublesided microlensspatialfilter array dmsfa, and aligned with a.
As such, it can potentially make nanofabrication much simpler. The tenderer shall enclose the copy of the same as pdf file in coveri of the etender while submitting the tender. However, the light modulation capability for both the conventional refractivetype mla and planar diffractivetype mla is still staying at the diffractionlimited scale. Layout decompression chip for maskless lithography. Parallel maskless optical lithography for prototyping, lowvolume production, and research dario gil,a rajesh menon, xudong tang, henry i. Maskless lithography advanced laser dynamic imaging aldirtr series roll to roll maskless exposure system technologies. Architecture and hardware design of lossless compression. Graphene inkjet maskless lithography supplemental info. Maskless optical lithography could well represent a disruptive technology that changes the complexion and direction of the semiconductor industry. It provide rapid prototype of new designs and ideas without costly photomasks.
Future maskless lithography systems require data throughputs of the order of tens of terabits per second in order to have comparable performance to today s maskbased lithography systems. Greyscale lithography why smart filter technology sft for greyscale. Most ml systems target binary imaging applications. Smith the increasingly important role of maskless the information revolution, which. In this paper, we examine the compression efficiency of a spectrum of techniques suitable for lithography data, including two industry standards jbig and jpegls, a wavelet based technique spiht, general file compression techniques zip and bzip2, our own 2dlz technique, and a simple listofrectangles representation rect. Focused ion beam lithography is commonly used for sputtering away defects or uncovering buried features. A maskless lithography system such as zpal provides flexibility and saves photomask costs at the expense of lower throughput. Nanofabrication2008 lecture 5 lg aalborg universitet. Mask less lithography provides solution in the form of several techniques which are cost effective. Architecture, algorithms and implementation by vito dai b. Lossless compression techniques for maskless lithography data. Mapper lithography is a european consortium developing a maskless lithography technology that combines massivelyparallel electronbeam writing in which 000 electron beams are focused on the wafer by electrostatic lens arrays.
Lithography technology has been one of the key enablers and drivers for the. High speed maskless lithography of printed circuit boards using. You can now employ the unmatched flexibility of maskless lithography in an industrial setting, on wafers with sizes up to 300 x 300 mm2. Rotalab offers a wide range of highthroughput maskless photolithographic patterning systems for research and production.
Maskless, resistless ion beam lithography unt digital. Photolithography, also called optical lithography or uv lithography, is a process used in microfabrication to pattern parts on a thin film or the bulk of a substrate also called a wafer. They have a very impressive description of their equipment on their web page. Among the four major alternative ngl approaches, ion beam lithography is the only one that can provide both maskless and resistless patterning. Mirrorbased pattern generation for maskless lithography. Techniques used for mask less lithography citeseerx. There is a limit to this technique since both the masks and pcb substrates themselves may. Unique microlithography results using maskless lithography jay sasserath, phd intelligent micro patterning llc st. Our knowledgeable and technically driven sales staffs attend a number of conferences and exhibitions globally. Zoneplate array lithography zpal is a novel method of maskless lithography that aims to alleviate some of these issues while offering a solution that can be extended to the limits of nanolithography. Unique maskless lithography technology is proven for greyscale. Todays optical lithography systems transfer one layer of data from the mask to the entire wafer in about sixty seconds.
The lithography tools used today in mask manufacturing are similar in concept to ml2 except for scale, both in throughput and feature size. Unique microlithography results using maskless lithography. To achieve a similar throughput for a directwrite maskless lithography system with a pixel size of 25 nm, data rates of about 10 tbs are required. Murrieta, ca july 9, 20 lightworks optical systems, inc. Maskless optical lithography, as described in this paper, offers a path around many of these difficulties. University of arizona optical sciences center high speed maskless lithography phototool executive summary introduction maskless lithography ml has wide applications, from nextgeneration semiconductor patterning to dropondemand inkjet fabrication of organic photopolymers and microoptics.
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